Booth No.6A-06
CategoryIngredients
PavilionChina Pavilion
SHENYANG PHOTOSENSITIVE CHEMICAL RESEARCH INSTITUTE
Booth No.：6A-06
Category：Ingredients
Pavilion：China Pavilion
Company Information
Email：
sales@syphotochem.com
TEL：
Address： 110141
no.2-12, 8a, No.6 Road, Shenyang Economic and Technological Development Zone CHINA URL： http://www.syphotochem.com
no.2-12, 8a, No.6 Road, Shenyang Economic and Technological Development Zone CHINA URL： http://www.syphotochem.com
Shenyang Photosensitive Chemical Research Institute was founded in 1969, affiliated to China Aerospace Science and Technology Corporation and is a state-owned scientific and technological chemical enterprise. Our production plant is located in Shenyang Economic and Technological Development Zone with total area of 50,000㎡.
Our company specializes in the research and development, production, application and sales of fine chemicals, producing photographic chemicals, thermal chemicals, pharmaceutical chemicals and custom chemicals which are widely used in photographic paper, papermaking, thermochromic materials, anti-counterfeiting, medical and other industries
Our company specializes in the research and development, production, application and sales of fine chemicals, producing photographic chemicals, thermal chemicals, pharmaceutical chemicals and custom chemicals which are widely used in photographic paper, papermaking, thermochromic materials, anti-counterfeiting, medical and other industries
Company information
| Address | 110141 no.2-12, 8a, No.6 Road, Shenyang Economic and Technological Development Zone CHINA |
|---|---|
| URL | http://www.syphotochem.com |
| sales@syphotochem.com |
| Product introduction |
3-Chlorosalicylic acid CAS 1829-32-9 3-(Trifluoromethyl)-5,6,7,8-tetrahydro-[1,2,4]triazolo[4,3-a]pyrazine Hydrochloride CAS 762240-92-6 2,6-Dihydroxybenzoic acid CAS 303-07-1 2,3-Dihydroxybenzoic acid CAS 303-38-8 4-Chloro-3-nitroanisole CAS 10298-80-3 Methyl 4,4-dimethyl-3-oxovalerate CAS 55107-14-7 |
|---|
Product introduction
3-Chlorosalicylic acid CAS 1829-32-93-(Trifluoromethyl)-5,6,7,8-tetrahydro-[1,2,4]triazolo[4,3-a]pyrazine Hydrochloride CAS 762240-92-6 2,6-Dihydroxybenzoic acid CAS 303-07-12,3-Dihydroxybenzoic acid CAS 303-38-84-Chloro-3-nitroanisole CAS 10298-80-3Methyl 4,4-dimethyl-3-oxovalerate CAS 55107-14-7