ブース番号6A-06
カテゴリー原料
パビリオン中国パビリオン

SHENYANG PHOTOSENSITIVE CHEMICAL RESEARCH INSTITUTE

小間番号:6A-06
カテゴリー:原料
パビリオン:中国パビリオン
企業情報
Email: sales@syphotochem.com TEL: 住所: no.2-12, 8a, No.6 Road, Shenyang Economic and Technological Development Zone 110141 URL: http://www.syphotochem.com
Shenyang Photosensitive Chemical Research Institute was founded in 1969, affiliated to China Aerospace Science and Technology Corporation and is a state-owned scientific and technological chemical enterprise. Our production plant is located in Shenyang Economic and Technological Development Zone with total area of 50,000㎡.
Our company specializes in the research and development, production, application and sales of fine chemicals, producing photographic chemicals, thermal chemicals, pharmaceutical chemicals and custom chemicals which are widely used in photographic paper, papermaking, thermochromic materials, anti-counterfeiting, medical and other industries

企業情報

住所 no.2-12, 8a, No.6 Road, Shenyang Economic and Technological Development Zone 110141
URL http://www.syphotochem.com
Email sales@syphotochem.com
出展製品・サービス 3-Chlorosalicylic acid CAS 1829-32-9新製品
3-(Trifluoromethyl)-5,6,7,8-tetrahydro-[1,2,4]triazolo[4,3-a]pyrazine Hydrochloride CAS 762240-92-6 新製品
2,6-Dihydroxybenzoic acid CAS 303-07-1新製品
2,3-Dihydroxybenzoic acid CAS 303-38-8新製品
4-Chloro-3-nitroanisole CAS 10298-80-3
Methyl 4,4-dimethyl-3-oxovalerate CAS 55107-14-7

出展製品・サービス

3-Chlorosalicylic acid CAS 1829-32-9新製品3-(Trifluoromethyl)-5,6,7,8-tetrahydro-[1,2,4]triazolo[4,3-a]pyrazine Hydrochloride CAS 762240-92-6 新製品2,6-Dihydroxybenzoic acid CAS 303-07-1新製品2,3-Dihydroxybenzoic acid CAS 303-38-8新製品4-Chloro-3-nitroanisole CAS 10298-80-3Methyl 4,4-dimethyl-3-oxovalerate CAS 55107-14-7